DOE Plasma Science CenterDOE Plasma Science Center

PUBLICATIONS 2016

  1. H. Aboubakr, U. Gangal, M. Youssef, S. Goyal and P. Bruggeman
    Inactivation of Virus in Solution by Cold Atmospheric Pressure Plasma: Identification of Chemical Inactivation Pathways, J. Phys. D: Appl. Phys. 49, 204001 (2016). [doi:10.1088/0022-3727/49/20/204001]

  2. C. E. Anderson, N. Cha, A. D. Lindsay, D. S. Clark, and D. B. Graves
    The Role of Interfacial Reactions in Determining Plasma–Liquid Chemistry, Plasma Chem. Plasma Process. 36, 1393 (2016). [doi:10.1007/s11090-016-9742-1]

  3. E. A. J. Bartis, A. J. Knoll, P. Luan, J. Seog, G. S. Oehrlein
    On the Interaction of Cold Atmospheric Pressure Plasma with Surfaces of Bio-molecules and Model Polymers, Plasma Chemistry and Plasma Processing 36, 121-149 (2016). [doi: 10.1007/s11090-015-9673-2]

  4. E. A. J. Bartis, P. Luan, A. J. Knoll, D. B. Graves, J. Seog, G. S. Oehrlein
    A Comparative Study of Biomolecule and Polymer Surface Modifications by a Surface Microdischarge, Eur. Phys. J. D. 70, 25 (2016). [doi:10.1140/epjd/e2015-60446-3]

  5. K. Bartschat and M. J. Kushner
    Electron Collisions with Atoms, Ions, Molecules, and Surfaces: Fundamental Science Empowering Advances in Technology, PNAS 113, 7026–7034 (2016). [doi:10.1073/pnas.1606132113] (PDF)

  6. G. Bauer and D. B. Graves
    Mechanisms of Selective Antitumor Action of Cold Atmospheric Plasma-derived Reactive Oxygen and Nitrogen Species, Plasma Process. Polym. 13, 1157–1178 (2016). [doi:10.1002/ppap.201600089]

  7. N. Bilik, B. L. Greenberg, J. Yang, E. S. Aydil, and U. R. Kortshagen
    Atmospheric-Pressure Glow Plasma Synthesis of Plasmonic and Photoluminescent Zinc Oxide Nanocrystals, J. Appl. Phys. 119, 243302 (2016). [doi:10.1063/1.4954323]

  8. P. J. Bruggeman, M. J. Kushner, B. R. Locke, J. G. E. Gardeniers, W. G. Graham, D. B. Graves, R. C. H. M. Hofman-Caris, D. Maric, J. P. Reid, E. Ceriani, D. Fernandez Rivas, J. E. Foster, S. C. Garrick, Y. Gorbanev, S. Hamaguchi, F. Iza, H. Jablonowski, E. Klimova, J. Kolb, F. Krcma, P. Lukes, Z. Machala, I. Marinov, D. Mariotti, S. Mededovic Thagard, D. Minakata, E. C. Neyts, J. Pawlat, Z. Lj. Petrovic, R. Pflieger, S. Reuter, D. C. Schram, S. Schröter, M. Shiraiwa, B. Tarabová, P. A. Tsai, J. R. R. Verlet, T. von Woedtke, K. R. Wilson, K. Yasui and G. Zvereva
    Review: Plasma–liquid Interactions: a Review and Roadmap, Plasma Sources Sci. Technol. 25, 053002 (2016). [doi: 10.1088/0963-0252/25/5/053002] (PDF)

  9. B. Bruneau, P. Diomede, D. J. Economou, S. Longo, T. Gans, D. O’Connell, A. Greb, E. Johnson, and J.-P. Booth
    Capacitively Coupled Hydrogen Discharges Sustained by Tailored Voltage Waveforms: Excitation Dynamics and Ion Flux Asymmetry, Plasma Sources Sci. Technol. 25, 045019 (2016). [doi:10.1088/0963-0252/25/4/045019]

  10. B. Bruneau, T. Lafleur, T. Gans, D. O'Connell, A. Greb, Ihor Korolov, A. Derzsi, Z. Donko, S. Brandt, E. Schuengel, J. Schulze, P. Diomede, D. Economou, S. Longo, E. Johnson, and J.-P. Booth
    Effect of Gas Properties on the Dynamics of the Electrical Slope Asymmetry Effect in Capacitive Plasmas: Comparison of Ar, H2 and CF4, Plasma Sources Sci. Technol. 25, 01L02 (2016). [doi:10.1088/0963-0252/25/1/01LT02]

  11. E. Despiau-Pujo, A. Davydova, G. Cunge, D. B. Graves
    Hydrogen Plasmas Processing of Graphene Surfaces, Plasma Chem. Plasma Process 36, 213–229 (2016). [doi:10.1007/s11090-015-9683-0]

  12. Y. Du, Z. Peng, D. Zhimin, N. Sadeghi and P. J. Bruggeman
    Is It Possible to Deduce the Ground State OH Density from Relative Optical Emission Intensities of the OH(A2Σ+-X2Πi) Transition in Atmospheric Pressure Non-equilibrium Plasmas?–An Analysis of Self-absorption, Plasma Sources Sci. Technol. 25, 04LT02 (2016). [doi:10.1088/0963-0252/25/4/04LT02]

  13. J. E. Foster and J. Lai
    2-D Apparatus for the Study of the Plasma Liquid Interface, IEEE Trans. Plasma Sci. 44, 1127 (2016). [doi: 10.1109/TPS.2016.2567322]

  14. S. Gershman and Y. Raitses
    Unstable Behavior of Atmospheric Pressure Anodic Arc Discharge, J. Physics D: Appl. Phys, 49, 345201 (2016). [doi: 10.1088/0022-3727/49/34/345201]

  15. R. Gopalakrishnan, E. Kawamura, A. J. Lichtenberg, M. A. Lieberman and D. B. Graves
    Solvated Electrons at the Atmospheric Pressure Plasma-water Anodic Interface, J. Physics D: Appl. Phys, 49, 295205 (2016). [doi:10.1088/0022-3727/49/29/295205]

  16. S. Iseni, P. J. Bruggeman, K. D. Weltmann and S. Reuter
    Nitrogen Metastable N2(A) in a Cold Argon Atmospheric Pressure Plasma Jet: Shielding and Gas Composition, Appl. Phys. Lett. 108, 184101 (2016). [doi:10.1063/1.4948535]

  17. I. Kaganovich and D. Sydorenko
    Band Structure of the Growth Rate of the Two-Stream Instability of an Electron Beam Propagating in a Bounded Plasma, Physics of Plasmas 23, 112116 (2016). [doi:10.1063/1.4967858]

  18. S. S. Kaler, Q. Lou, V. M. Donnelly and D. J. Economou
    Silicon Nitride and Silicon Etching by CH3F/O2 and CH3F/CO2 Plasma Beams, J. Vac. Sci. Technol. A 34, 041301 (2016). [doi: 10.1116/1.4949261]

  19. M. Kawakami, D. Metzler, C. Li and G. S. Oehrlein
    Effect of the Chamber Wall on Fluorocarbon-assisted Atomic Layer Etching of SiO2 Using Cyclic Ar/C4F8 Plasma, J. Vac. Sci. Technol. A 34, 040603 (2016). [doi:10.1116/1.4949260]

  20. E. Kawamura, A. J. Lichtenberg, M. A. Lieberman and A. M. Marakhnatov
    2D Fluid-Analytical Simulation of Electromagnetic Effects in Low Pressure, High Frequency, Electronegative Capacitive Discharges, Plasma Sources Sci. Technol. 25, 035007 (2016). [doi:10.1088/0963-0252/25/3/035007]

  21. E. Kawamura, M. A. Lieberman and A.J. Lichtenberg
    Standing Striations Due to Ionization Instability in Atmospheric Pressure He/H2O Radio Frequency Capacitive Discharges, Plasma Sources Sci. Technol. 25, 054009 (2016). [doi:10.1088/0963-0252/25/5/054009]

  22. A. J. Knoll, P. Luan, E. A. J. Bartis, V. S. S.K. Kondeti, P. J. Bruggeman and G. S. Oehrlein
    Cold Atmospheric Pressure Plasma VUV Interactions with Surfaces: Effect of Local Gas environment and Source Design, Plasma Process. Polym. 13, (2016) [doi:10.1002/ppap.201600043]

  23. V. I. Kolobov and R. R. Arslanbekov
    Electrostatic PIC with Adaptive Cartesian Mesh, Journal of Physics: Conference Series 719, 012020 (2016). [doi: 10.1088/1742-6596/719/1/012020]

  24. U. Kortshagen
    Nonthermal Plasma Synthesis of Nanocrystals: Fundamentals, Applications, and Future Research Needs, Plasma Chemistry and Plasma Processing 36, 73-84, (2016). [doi:10.1007/s11090-015-9663-4]

  25. U. R. Kortshagen, R. M. Sankaran, R. N. Pereira, S. L. Girshick, J. J. Wu and E. S. Aydil
    Nonthermal Plasma Synthesis of Nanocrystals: Fundamental Principles, Materials, and Applications, Chemical Reviews 116, 11061−11127 (2016). [doi:10.1021/acs.chemrev.6b00039]

  26. R. Le Picard and S. L. Girshick
    The Effect of Single-Particle Charge Limits on Charge Distributions in Dusty Plasmas, Journal of Physics D: Applied Physics 49, 095201 (2016). [doi:10.1088/0022-3727/49/9/095201]

  27. R. Le Picard and S. L. Girshick
    Reply to Comment on “The Effect of Single-Particle Charge Limits on Charge Distributions in Dusty Plasmas”, Journal of Physics D: Applied Physics 49, 388002 (2016). [doi:10.1088/0022-3727/49/38/388002]

  28. R. Le Picard, A. H. Markosyan, D. H. Porter, S. L. Girshick and M. J. Kushner
    Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport, Plasma Chem. Plasma Process. 36, 941-972 (2016). [doi:10.1007/s11090-016-9721-6] (PDF)

  29. C. Li, D. Metzler, C. S. Lai, E. A. Hudson, and G. S. Oehrlein
    Fluorocarbon Based Atomic Layer Etching of Si3N4 and Etching Selectivity of SiO2 over Si3N4, J. Vac. Sci. Tech. A 34, 041307 (2016). [doi:10.1116/1.4954961]

  30. M. A. Lieberman, A. J. Lichtenberg, E. Kawamura and P. Chabert
    Linear Electromagnetic Excitation of an Asymmetric Low Pressure Capacitive Discharge with Two Unequal Sheath Widths, Phys. Plasmas 23, 013501 (2016). [doi: 10.1063/1.4938204]

  31. A. M. Lietz and M. J. Kushner
    Air Plasma Treatment of Liquid Covered Tissue: Long Timescale Chemistry, J. Phys. D: Appl. Phys. 49, 425204 (2016). [1088/0022-3727/49/42/425204] (PDF)

  32. A. Lindsay, D. B. Graves, and S. Shannon
    Fully Coupled Simulation of the Plasma Liquid Interface and Interfacial Coefficient Effects, J. Phys. D: Appl. Phys. 49, 235204 (2016) .[doi:10.1088/0022-3727/49/23/235204]

  33. A. H. Markosyan and M. J. Kushner
    Plasma Formation in Diode Pumped Alkali Lasers Sustained in Cs, J. Appl. Phys. 120, 193105 (2016). [doi:10.1063/1.4967749] (PDF)

  34. P. Masherov, V. Riaby and V. Godyak
    Integral Electrical Characteristics and Local Plasma Parameters of a RF Ion Thruster, Rev. Sci. Instrum. 87, 02B926 (2016). [doi:10.1063/1.4935003]

  35. D. Metzler, K. Uppireddi, R. L. Bruce, H. Miyazoe, Y. Zhu, W. Price, E. S. Sikorski, C. Li, S. U. Engelmann, E. A. Joseph, and G. S. Oehrlein
    Application of Cyclic Fluorocarbon/argon Discharges to Device Patterning, J. Vac. Sci. Technol. A 34, 01B102 (2016). [doi:10.1116/1.4935460]

  36. D. Metzler, C. Li, R. L. Bruce, E. A. Joseph, and G. S. Oehrlein
    Fluorocarbon Assisted Atomic Layer Etching of SiO2 and Si Using Cyclic Ar/C4F8 and Ar/CHF3 Plasma, J. Vac. Sci. Technol. A 34, 01B101 (2016). [doi:10.1116/1.4935462]

  37. D. Metzler, F. Weilnboeck, S. Engelmann, R. L. Bruce, G. S. Oehrlein
    He Plasma Pretreatment of Organic Masking Materials for Performance Improvement During Pattern Transfer by Plasma Etching, J. Vac. Sci. Technol. B 34, 041604 (2016). [doi:10.1116/1.4949274]

  38. S. A. Norberg, E. Johnsen and M. J. Kushner
    Helium Atmospheric Pressure Plasma Jets Interacting with Wet Cells: Delivery of Electric Fields, J. Phys. D 49, 185201 (2016). [doi:10.1088/0022-3727/49/18/185201].(PDF)

  39. Y. Qin, N. Bilik, U. R. Kortshagen, E. S. Aydil
    Laser Light Scattering from Silicon Particles Generated in an Argon Diluted Silane Plasma, J. Phys. D: Appl. Phys., 49, 085203, (2016). [doi:10.1088/0022-3727/49/8/085203]. (PDF)

  40. A. Roettgen, I. Shkurenkov, M. Simeni Simeni, V. Petrishchev, I.V. Adamovich, and W.R. Lempert
    Time-Resolved Electron Density and Electron Temperature Measurements in Nanosecond Pulse Discharges in Helium, Plasma Sources Science and Technology, 25, 055009 (2016). [doi:10.1088/0963-0252/25/5/055009]

  41. A. Roettgen, I. Shkurenkov, M. Simeni Simeni, I.V. Adamovich, and W.R. Lempert
    Time-Resolved Electron Temperature and Electron Density Measurements in a Nanosecond Pulse Filament Discharge in H2-He and O2-He Mixtures, Plasma Sources Science and Technology, 25, 055008 (2016). [doi:10.1088/0963-0252/25/5/055008]

  42. I. Shkurenkov and I. V. Adamovich
    Energy Balance in Nanosecond Pulse Discharges in Nitrogen and Air, Plasma Sources Sci. and Technol. 25, 015021 (2016). [doi:10.1088/0963-0252/25/1/015021]

  43. M. Simeni Simeni, A. Roettgen, V. Petrishchev, K. Frederickson, and I. V. Adamovich
    Electron Density and Electron Temperature Measurements in Nanosecond Pulse Discharges over Liquid Water Surface, Plasma Sources Sci. Technol. 25, 064005 (2016). [doi:10.1088/0963-0252/25/6/064005]

  44. S. Sridhar, L. Liu, E. Hirsch, V. M. Donnelly and D. J. Economou
    Insights into the Mechanism of In-plasma Photo-assisted Etching Using Optical Emission Spectroscopy, J. Vac. Sci. & Technol. A 34, 161303 (2016). [doi:10.1116/1.4964641]

  45. D. Sydorenko, I. D. Kaganovich, P. L. G. Ventzek and L. Chen
    Effect of Collisions on the Two-stream Instability in a Finite Length Plasma, Physics of Plasmas 23, 122119 (2016). [doi:10.1063/1.4972543]

  46. A. Tavant and M.A. Lieberman
    Hybrid Global Model of Water Cluster Ions in Atmospheric Pressure Ar/H2O RF Capacitive Discharges, J. Phys. D: Appl. Phys. 49, 465201 (2016). [doi:10.1088/0022-3727/49/46/465201]

  47. W. Tian, A. M. Lietz and M. J. Kushner
    The Consequences of Air Flow on the Distribution of Aqueous Species During Dielectric Barrier Discharge Treatment of Thin Water Layers, Plasma Sources Sci. Technol. 25, 055020 (2016). [10.1088/0963-0252/25/5/055020] (PDF)

  48. De-Qi Wen, W. Liu, F. Gao, M. A. Lieberman and Y.-N. Wang
    A Hybrid Model of Radio Frequency Biased Inductively Coupled Plasma Discharges: Descriptions of Model and Experimental Validation in Argon, Plasma Source Sci. Technol. 25, 045009 (2016). [doi:10.1088/0963-0252/25/4/045009]

  49. J. Wu, V.S.S.K. Kondeti, P. Bruggeman and U. Kortshagen
    Luminescent, Water-soluble Silicon Quantum Dots via Micro-plasma Surface Treatment, J. Phys. D: Appl. Phys. 49, 08LT02 (2016). [doi:10.1088/0022-3727/49/8/08LT02]

  50. W. Yan and D. J. Economou
    Simulation of a Non-equilibrium Helium Plasma Bullet Emerging into Oxygen at High Pressure (250-760 Torr) and Interacting with a Substrate, J. Appl. Phys. 120, 123304 (2016). [doi:10.1063/1.4963115]