DOE Plasma Science CenterDOE Plasma Science Center

PUBLICATIONS 2017

  1. J. Carlsson, A. Khrabrov, I. Kaganovich, T. Sommerer and D. Keating
    Validation and Benchmarking of Two Particle-in-cell Codes for a Glow Discharge, Plasma Sources Sci. Technol. 26 014003 (2017). [doi:10.1088/0963-0252/26/1/014003]

  2. D. J. Economou
    Hybrid Simulation of Low Temperature Plasmas: A Brief Tutorial, Plasma Processes and Polymers 14, 1600152 (2017). [doi: 10.1002/ppap.201600152]

  3. K. Frederickson, Y.-C. Hung, W.R. Lempert, and I.V. Adamovich
    Control of Vibrational Distribution Functions in Nonequilibrium Molecular Plasmas and High-Speed Flows, Plasma Sources Sci. Technol. 26 014002 (2017). [doi:10.1088/0963-0252/26/1/014002]

  4. A. R. Gibson, M. Foucher, D. Marinov, P. Chabert, T. Gans, M. J. Kushner and J.-P. Booth
    The Role of Thermal Energy Accommodation and Atomic Recombination Probabilities in Low Pressure Oxygen Plasmas, Plasma Phys. Control. Fusion 59, 024004 (2017).[doi:10.1088/1361-6587/59/2/024004] (PDF)

  5. S. Huang, V. Volynets, J. R. Hamilton, S. Lee, I.-C. Song, S. Lu, J. Tennyson and M. J. Kushner
    Insights to Scaling Remote Plasma Sources Sustained in NF3 Mixtures, J. Vac. Sci. Technol. A 35, 031302 (2017). [doi:10.1116/1.4978551] ( PDF)

  6. C. M. Huard, Y. Zhang, S. Sriraman, A. Paterson, K. J. Kanarik and M. J. Kushner
    Atomic Layer Etching of 3D Structures in Silicon: Self-limiting and Nonideal Reactions, J. Vac. Sci. Technol. A 35, 031306 (2017). [doi:10.1116/1.4979661] (PDF)

  7. C. Huard, Y. Zhang, S. Sriraman, A. Paterson and M. J. Kushner
    Role of Neutral Transport in Aspect Ratio Dependent Plasma Etching of Three-dimensional Features, J. Vac. Sci. Technol. A 35, 05C301 (2017). [doi:10.1116/1.4973953] (PDF)

  8. E. Kawamura, M. A. Lieberman, A. J. Lichtenberg
    Ionization Instability Induced Striations in Atmospheric Pressure He/H2O RF and DC Discharges, J. Phys. D: Appl. Phys. 50, 145204 (2017). [doi:10.1088/1361-6463/aa5fe4]

  9. J. Kruszelnicki, K. W. Engeling, J. E. Foster, Z. Xiong and M. J. Kushner
    Propagation of Negative Electrical Discharges Through 2-dimensional Packed Bed Reactors, J. Phys. D: Appl. Phys. 50, 025203 (2017). [doi:10.1088/1361-6463/50/2/025203] (PDF)

  10. C. Larriba-Andaluz and S. L. Girshick
    Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon-Silane Plasmas, Plasma Chemistry and Plasma Processing 37, 43 (2017). [doi:10.1007/s11090-016-9749-7]

  11. P. Luan, A. J. Knoll, H. Wang, V. S. S. K. Kondeti, P. J. Bruggeman, and G. S. Oehrlein
    Model Polymer Etching and Surface Modification by a Time Modulated RF Plasma Jet: Role of Atomic Oxygen and Water Vapor, J. Phys. D: Appl. Phys. 50, 03LT02 (2017). [doi:10.1088/1361-6463/aa4e97]

  12. D. Metzler, C. Li, S. Engelmann, R. L. Bruce, E. A. Joseph and G. S. Oehrlein
    Characterizing Fluorocarbon Assisted Atomic Layer Etching of Si Using Cyclic Ar/C4F8 and Ar/CHF3 Plasma, J. Chem. Phys. 146, 052801 (2017). [doi: 10.1063/1.4961458]

  13. G. Shafir, D. Zolotukhin, V. Godyak, A. Shlapakovski, S. Gleizer, Ya. Slutsker, R. Gad, V. Bernshtam, Yu. Ralchenko and Ya. E. Krasik
    Characterization of Inductively Coupled Plasma Generated by a Quadruple Antenna, Plasma Sources Sci. Technol. 26, 025005 (2017). [doi:10.1088/1361-6595/aa5300]

  14. P. Tian and M. J. Kushner
    Controlling VUV Photon Fluxes in Pulsed Inductively Coupled Ar/Cl2 Plasmas and Potential Applications in Plasma Etching, Plasma Sources Sci. Technol. 26, 024005 (2017). [10.1088/1361-6595/26/2/024005] (PDF)

  15. De-Qi Wen, E. Kawamura, M. A. Lieberman, A. J. Lichtenberg and You-Nian Wang
    Non-linear Series Resonance and Standing Waves in Dual–frequency Capacitive Discharges, Plasma Sources Sci. Technol. 26, 015007 (2017). [doi:10.1088/0963-0252/26/1/015007]

  16. H. Wang, V. S. Sukhomlinov, I. D. Kaganovich, A. S. Mustafaev
    Simulations of Ion Velocity Distribution Functions Taking into Account Both Elastic and Charge Exchange Collisions, Plasma Sources Sci. Technol. 26 024001 (2017). [doi:10.1088/1361-6595/26/2/024001]

  17. H. Wang, V. S. Sukhomlinov, I. D. Kaganovich, A. S. Mustafaev
    Ion Velocity Distribution Functions in Argon and Helium Discharges: Detailed Comparison of Numerical Simulation Results and Experimental Data, Plasma Sources Sci. Technol. 26 024002 (2017). [doi:10.1088/1361-6595/26/2/024002]

  18. Y. Zhang, C. Huard, S. Sriraman, J. Belen, A. Paterson and M. J. Kushner
    Investigation of Feature Orientation and Consequences of Ion Tilting During Plasma Etching with a Three-dimensional Feature Profile Simulator, J. Vac. Sci. Technol. A 35, 021303 (2017). [doi: 10.1116/1.4968392] (PDF)