DOE Plasma Science CenterDOE Plasma Science Center

PUBLICATIONS 2017

  1. I. Adamovich, S. Baalrud, A. Bogaerts, P. J. Bruggeman, M. Cappelli, V. Colombo, U. Czarnetzki, U. Ebert, J. G. Eden, P. Favia, D. B. Graves, S. Hamaguchi, G. Hieftje, M. Hori, I. D. Kaganovich, U. Kortshagen, M. J. Kushner, N. J. Mason, S. Mazouffre, S. Mededovic Thagard, H.-R. Metelmann, A. Mizuno, E. Moreau, A. B. Murphy, B. A. Niemira, G. S. Oehrlein, Z. Lj. Petrovic, L. C. Pitchford, Y.-K. Pu, S. Rauf, O. Sakai, S. Samukawa, S. Starikovskaia, J. Tennyson, K. Terashima, M. M. Turner, M. C. M. van de Sanden, A. Vardelle
    The 2017 Plasma Roadmap: Low Temperature Plasma Science and Technology, Journal of Physics D: Applied Physics 50, 323001 (2017). [doi:10.1088/1361-6463/aa76f5] (PDF)

  2. E. V. Barnat and A. Fierro
    Ultrafast Laser-collision-induced Fluorescence in Atmospheric Pressure Plasma, J. Phys. D: Appl. Phys 50, 14LT01 (2017). [doi:10.1088/1361-6463/aa5f1e] (PDF)

  3. P. J. Bruggeman, F. Iza and R. Brandenburg
    Foundations of High Pressure Non-equilibrium Plasmas, Plasma Sources Sci. Technol. 26, 123002 (2017). [doi:10.1088/1361-6595/aa97af]

  4. J. Carlsson, A. Khrabrov, I. Kaganovich, T. Sommerer and D. Keating
    Validation and Benchmarking of Two Particle-in-cell Codes for a Glow Discharge, Plasma Sources Sci. Technol. 26 014003 (2017). [doi:10.1088/0963-0252/26/1/014003]

  5. A. Davydova, E. Despiau-Pujo, G. Cunge, and D. B. Graves
    H+ Ion-induced Damage and Etching of Multilayer Graphene in H2 Plasmas, J. Appl. Phys. 121, 133301 (2017). [doi:10.1063/1.4979023] (PDF)

  6. Y. Du, G. Nayak, G. Oinuma, Y. Ding, Z. Peng and P. J. Bruggeman
    Emission Considering Self-absorption of OH to Simultaneously Obtain the OH Density and Gas Temperature: Validation, Non-equilibrium Effects and Limitations, Plasma Sources Sci. Technol. 26, 095007 (2017). [doi:10.1088/1361-6595/aa8688]

  7. Y. Du, G. Nayak, G. Oinuma, Z. Peng, and P. J. Bruggeman
    Effect of Water Vapor on Plasma Morphology, OH and H2O2 Production in He and Ar Atmospheric Pressure Dielectric Barrier Discharges, J. Phys. D: Appl. Phys. 50, 145201 (2017). [doi:10.1088/1361-6463/aa5e7d]

  8. D. J. Economou
    Hybrid Simulation of Low Temperature Plasmas: A Brief Tutorial, Plasma Processes and Polymers 14, 1600152 (2017). [doi: 10.1002/ppap.201600152]

  9. D. T. Elg, I.-W. Yang and D. B Graves
    Production of TEMPO by O Atoms in Atmospheric Pressure Non-thermal Plasma–liquid Interactions, J. Phys. D: Appl. Phys. 50, 475201, (2017). [doi:10.1088/1361-6463/aa8f8c] (PDF)

  10. J. Foster
    Plasma-Based Water Purification: Challenges and Prospects for the Future, Phys. Plasmas 24, 055501, 2017. [doi:10.1063/1.4977921]

  11. J. B. Franek, S. H. Nogami, M. E. Koepke, V. I. Demidov and E. V. Barnat
    Dynamics of Atomic Kinetics in a Pulsed Positive-column Discharge at 100 Pa, Plasma Phys. Control. Fusion 59, 014005 (2017). [doi:10.1088/0741-3335/59/1/014005] (PDF)

  12. K. Frederickson, Y.-C. Hung, W.R. Lempert, and I.V. Adamovich
    Control of Vibrational Distribution Functions in Nonequilibrium Molecular Plasmas and High-Speed Flows, Plasma Sources Sci. Technol. 26 014002 (2017). [doi:10.1088/0963-0252/26/1/014002]

  13. Y. Fu, G. M. Parsey, J. P. Verboncoeur and A. J. Christlieb
    Investigation on the Effect of Nonlinear Processes on Similarity Law in High-pressure Argon Discharges, Phys. Plasmas 24, 113518 (2017). [doi:10.1063/1.5005112] (PDF)

  14. Y. Fu, J. P. Verboncoeur and A. J. Christlieb
    Pressure Effect on a Tandem Hollow Cathode Discharge in Argon, Phys. Plasmas 24, 103514 (2017). [doi:10.1063/1.5004681] (PDF)

  15. Y. Fu, J. P. Verboncoeur, A. J. Christlieb and X. Wang
    Transition Characteristics of Low-pressure Discharges in a Hollow Cathode, Phys. Plasmas 24, 083516 (2017). [doi:10.1063/1.4997764] (PDF)

  16. Y. Fu, X.Wang, X. Zou, Y. Shuo, J. P. Verboncoeur and A. J. Christlieb
    Investigation on the Similarity Law of Low Pressure Glow Discharges Based on the Light Intensity Distributions in Geometrically Similar Gaps, Phys. Plasmas 24, 083510 (2017). [doi:10.1063/1.4997425] (PDF)

  17. M. C. García, M. Mora, D. Esquivel, J. E. Foster, A. Rodero, C. Jiménez-Sanchidrián and F. J. Romero-Salguero
    Microwave Atmospheric Pressure Plasma Jets for Wastewater Treatment: Degradation of Methylene Blue as a Model Dye, Chemosphere 180, 239-246 (2017). [doi: 10.1016/j.chemosphere.2017.03.126]

  18. A. R. Gibson, M. Foucher, D. Marinov, P. Chabert, T. Gans, M. J. Kushner and J.-P. Booth
    The Role of Thermal Energy Accommodation and Atomic Recombination Probabilities in Low Pressure Oxygen Plasmas, Plasma Phys. Control. Fusion 59, 024004 (2017).[doi:10.1088/1361-6587/59/2/024004] (PDF)

  19. D. Gidon, D. B. Graves and A. Mesbah
    Effective Dose Delivery in Atmospheric Pressure Plasma Jets for Plasma Medicine: a Model Predictive Control Approach Plasma Sources Sci. Technol. 26, 085005, (2017). [doi:10.1088/1361-6595/aa7c5d] (PDF)

  20. V. A. Godyak
    Comments on Plasma Diagnostics with Microwave Probes, Phys. Plasmas 24, 060702 (2017). [doi:10.1063/1.4984781] (PDF)

  21. V. A. Godyak and B. M. Alexandrovich
    Power Measurements and Coupler Optimization in Inductive Discharges, Rev. Sci. Instrum. 88, 083512 (2017). [doi:10.1063/1.4995810] (PDF)

  22. S. Huang, V. Volynets, J. R. Hamilton, S. Lee, I.-C. Song, S. Lu, J. Tennyson and M. J. Kushner
    Insights to Scaling Remote Plasma Sources Sustained in NF3 Mixtures, J. Vac. Sci. Technol. A 35, 031302 (2017). [doi:10.1116/1.4978551] ( PDF)

  23. C. M. Huard, Y. Zhang, S. Sriraman, A. Paterson, K. J. Kanarik and M. J. Kushner
    Atomic Layer Etching of 3D Structures in Silicon: Self-limiting and Nonideal Reactions, J. Vac. Sci. Technol. A 35, 031306 (2017). [doi:10.1116/1.4979661] (PDF)

  24. C. Huard, Y. Zhang, S. Sriraman, A. Paterson and M. J. Kushner
    Role of Neutral Transport in Aspect Ratio Dependent Plasma Etching of Three-dimensional Features, J. Vac. Sci. Technol. A 35, 05C301 (2017). [doi:10.1116/1.4973953] (PDF)

  25. C. Jin, A. Ottaviano and Y. Raitses
    Secondary Electron Emission Yield from High Aspect Ratio Surfaces, J. of Appl. Phys. 122, 173301 (2017). [doi:10.1063/1.4993979]

  26. S. S. Kaler, Q. Lou, V. M. Donnelly and D. J. Economou
    Atomic Layer Etching of Silicon Dioxide Using Alternating C4F8 and Energetic Ar+ Plasma Beams, J. Phys. D: Appl. Phys. 50, 234001 (2017). [doi:10.1088/1361-6463/aa6f40]

  27. E. Kawamura, M. A. Lieberman, A. J. Lichtenberg
    Ionization Instability Induced Striations in Atmospheric Pressure He/H2O RF and DC Discharges, J. Phys. D: Appl. Phys. 50, 145204 (2017). [doi:10.1088/1361-6463/aa5fe4]

  28. E. Kawamura, De-Qi Wen, M. A. Lieberman and A. J. Lichtenberg
    Effect of a Dielectric Layer on Plasma Uniformity in High Frequency Electronegative Capacitive Discharges, J. Vac. Sci. Technol. A 35, 05C311 (2017). [doi:10.1116/1.4993595] (PDF)

  29. V. I. Kolobov and V. A. Godyak
    Inductively Coupled Plasmas at Low Driving Frequencies, Plasma Sources Sci. Technol. 26 075013 (2017). [doi:10.1088/1361-6595/aa7584] (PDF)

  30. V. S. S. K. Kondeti, U. Gangal, S. Yatom and P. J. Bruggeman
    Ag+ Reduction and Silver Nanoparticle Synthesis at the Plasma–liquid Interface by an RF Driven Atmospheric Pressure Plasma Jet: Mechanisms and the Effect of Surfactant, J. Vac. Sci. Technol. A 35, 061302 (2017). [doi:10.1116/1.4995374]

  31. J. Kruszelnicki, K. W. Engeling, J. E. Foster, Z. Xiong and M. J. Kushner
    Propagation of Negative Electrical Discharges Through 2-dimensional Packed Bed Reactors, J. Phys. D: Appl. Phys. 50, 025203 (2017). [doi:10.1088/1361-6463/50/2/025203] (PDF)

  32. S. J. Lanham and M. J. Kushner
    Effects of a Chirped Bias Voltage on Ion Energy Distributions in Inductively Coupled Plasma Reactors, J. Appl. Phys. 122, 083301 (2017). [doi:10.1063/1.4993785] (PDF)

  33. C. Larriba-Andaluz and S. L. Girshick
    Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon-Silane Plasmas, Plasma Chemistry and Plasma Processing 37, 43 (2017). [doi:10.1007/s11090-016-9749-7] (PDF)

  34. A. M. Lietz, E. Johnsen and M. J. Kushner
    Plasma-induced Flow Instabilities in Atmospheric Pressure Plasma Jets, Appl. Phys. Lett. 111, 114101 (2017). [doi:10.1063/1.4996192] (PDF)

  35. P. Luan, A. J. Knoll, H. Wang, V. S. S. K. Kondeti, P. J. Bruggeman, and G. S. Oehrlein
    Model Polymer Etching and Surface Modification by a Time Modulated RF Plasma Jet: Role of Atomic Oxygen and Water Vapor, J. Phys. D: Appl. Phys. 50, 03LT02 (2017). [doi:10.1088/1361-6463/aa4e97] (PDF)

  36. P. Luan, A. J. Knoll, P. J. Bruggeman and G. S. Oehrlein
    Plasma–surface Interaction at Atmospheric Pressure: A Case Study of Polystyrene Etching and Surface Modification by Ar/O2 Plasma Jet, J. Vac. Sci. Technol. A 35, 05C315 (2017). [doi:10.1116/1.5000691] (PDF)

  37. M. Mamunuru, R. Le Picard, Y. Sakiyama and S. L. Girshick
    The Existence of Non-negatively Charged Dust Particles in Nonthermal PlasmasPlasma Chem. Plasma Process 37, 701–715 (2017). [doi:10.1007/s11090-017-9798-6] (PDF)

  38. D. Metzler, C. Li, S. Engelmann, R. L. Bruce, E. A. Joseph and G. S. Oehrlein
    Characterizing Fluorocarbon Assisted Atomic Layer Etching of Si Using Cyclic Ar/C4F8 and Ar/CHF3 Plasma, J. Chem. Phys. 146, 052801 (2017). [doi: 10.1063/1.4961458] (PDF)

  39. D. Metzler, C. Li, C. S. Lai, E. A. Hudson, G. S. Oehrlein
    Investigation of Thin Oxide Layer Removal from Si Substrates Using an SiO2 Atomic Layer Etching Approach: The Importance of the Reactivity of the Substrate, J. Phys. D: Appl. Phys. 50, 254006 (2017). [doi: 10.1088/1361-6463/aa71f1] (PDF)

  40. A. K. Patnaik, I. Adamovich, J. R. Gord, and S. Roy
    Recent Advances in Ultrafast-Laser-Based Spectroscopy and Imaging for Reacting Plasmas and Flames, Plasma Sources Science and Technology 26, 103001 (2017). [doi:10.1088/1361-6595/aa8578]

  41. C. Qu, P. Tian, A. Semnani and M. J. Kushner
    Properties of Arrays of Microplasmas: Application to Control of Electromagnetic Waves, Plasma Sources Sci. Technol. 26, 105006 (2017). [doi:10.1088/1361-6595/aa8d53] (PDF)

  42. B. Scheiner, E. V. Barnat, S. D. Baalrud, M. M. Hopkins, and B. T. Yee
    Theory and Simulation of Anode Spots in Low Pressure Plasmas, Physics of Plasmas 24, 113520 (2017). [doi:10.1063/1.4999477] (PDF)

  43. G. Shafir, D. Zolotukhin, V. Godyak, A. Shlapakovski, S. Gleizer, Ya. Slutsker, R. Gad, V. Bernshtam, Yu. Ralchenko and Ya. E. Krasik
    Characterization of Inductively Coupled Plasma Generated by a Quadruple Antenna, Plasma Sources Sci. Technol. 26, 025005 (2017). [doi:10.1088/1361-6595/aa5300] (PDF)

  44. M. Simeni Simeni, B. M. Goldberg, C. Zhang, K. Frederickson, W. R. Lempert, and I. V. Adamovich
    Electric Field Measurements in a Nanosecond Pulse Discharge in Atmospheric Air, Journal of Physics D: Applied Physics 50, 184002 (2017). [doi:10.1088/1361-6463/aa6668]

  45. N. Sternberg and V. Godyak
    Plasma Density Perturbation Caused byProbes at Low Gas Pressure, Phys. Plasmas 24, 093504 (2017). [doi:10.1063/1.4990397] (PDF)

  46. C. Swanson and I. D. Kaganovich
    'Feathered' Fractal Surfaces to Minimize Secondary Electron Emission for a Wide Range of Incident Angles, J. Appl. Phys. 122, 043301 (2017). [doi:10.1063/1.4995535] (PDF)

  47. E. J. Szili, N. Gaur, S.-H. Hong, H. Kurita, J.-S. Oh, M. Ito, A. Mizuno, A. Hatta, A. J. Cowin, D. B. Graves and R. D. Short
    The Assessment of Cold Atmospheric Plasma Treatment of DNA in Synthetic Models of Tissue Fluid, Tissue and Cells, J. Phys. D: Applied Physics 50, 274001, (2017). [doi:10.1088/1361-6463/aa7501] (PDF)

  48. P. Tian and M. J. Kushner
    Controlling VUV Photon Fluxes in Pulsed Inductively Coupled Ar/Cl2 Plasmas and Potential Applications in Plasma Etching, Plasma Sources Sci. Technol. 26, 024005 (2017). [10.1088/1361-6595/26/2/024005] (PDF)

  49. A. G. Volkov, K. G. Xu, V. I. Kolobov
    Cold Plasma Interactions with Plants: Morphing and Movements of Venus Flytrap and Mimosa pudica Induced by Argon Plasma Jet, Bioelectrochemistry 118, 100-105 (2017). [doi:10.1016/j.bioelechem.2017.07.011] (PDF)

  50. H. Wang, V. S. Sukhomlinov, I. D. Kaganovich, A. S. Mustafaev
    Simulations of Ion Velocity Distribution Functions Taking into Account Both Elastic and Charge Exchange Collisions, Plasma Sources Sci. Technol. 26 024001 (2017). [doi:10.1088/1361-6595/26/2/024001]

  51. H. Wang, V. S. Sukhomlinov, I. D. Kaganovich, A. S. Mustafaev
    Ion Velocity Distribution Functions in Argon and Helium Discharges: Detailed Comparison of Numerical Simulation Results and Experimental Data, Plasma Sources Sci. Technol. 26 024002 (2017). [doi:10.1088/1361-6595/26/2/024002]

  52. De-Qi Wen, E. Kawamura, M. A. Lieberman, A. J. Lichtenberg and You-Nian Wang
    Non-linear Series Resonance and Standing Waves in Dual–frequency Capacitive Discharges, Plasma Sources Sci. Technol. 26, 015007 (2017). [doi:10.1088/0963-0252/26/1/015007]

  53. De-Qi Wen, E. Kawamura, M. A. Lieberman, A. J. Lichtenberg and You-Nian Wang
    Two-Dimensional Particle-in-Cell Simulations of Standing Waves and Wave-Induced Hysteresis in Asymmetric Capacitive Discharges, J. Phys. D: Appl. Phys. 50, 495201 (2017). [doi:10.1088/1361-6463/aa9627] (PDF)

  54. De-Qi Wen, Yu-Ru Zhang, M. A. Lieberman and You-Nian Wang
    Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O2 Discharges by using a Hybrid Model, Plasma Processes and Polymers 14, 1600100 (2017). [doi:10.1002/ppap.201600100] (PDF)

  55. C. Winters, Y.-C. Hung, E. Jans, Z. Eckert, K. Frederickson, I. V. Adamovich, and N. Popov
    OH Radical Kinetics in Hydrogen-Air Mixtures at the Conditions of Strong Vibrational Nonequilibrium, Journal of Physics D: Applied Physics 50, 505203 (2017). [doi:10.1088/1361-6463/aa97b4]

  56. Z. Xiong and D. B. Graves
    A Novel Cupping-assisted Plasma Treatment for Skin Infection, J. Phys. D: Appl. Phys. 50, 05LT01, (2017). [doi:10.1088/1361-6463/50/5/05LT01] (PDF)

  57. L. Xu, A. V. Khrabrov, I. D. Kaganovich and T. J. Sommerer
    Investigation of the Paschen Curve for Helium in the 100–1000 kv Range, Phys. Plasmas 24, 093511 (2017). [doi:10.1063/1.5000387] (PDF)

  58. W. Yan and D. J. Economou
    Gas Flow Rate Dependence of the Discharge Characteristics of a Helium Atmospheric Pressure Plasma Jet Interacting with a Substrate, J. Phys. D: Appl. Phys. 50, 415205 (2017). [doi:10.1088/1361-6463/aa8794] (PDF)

  59. S. Yatom, Y. Luo, Q. Xiong and P. J. Bruggeman
    Nanosecond Pulsed Humid Ar Plasma Jet in Air: Shielding, Discharge Characteristics and Atomic Hydrogen Production, J. Phys. D: Appl. Phys. 50, 415204 (2017). [doi:10.1088/1361-6463/aa879c]

  60. B. T. Yee, B. Scheiner, S. D. Baalrud, E. V. Barnat and M. M. Hopkins
    Electron Presheaths: the Outsized Influence of Positive Boundaries on Plasmas, Plasma Sources Sci. Technol. 26, 025009 (2017). [doi: 10.1088/1361-6595/aa56d7] (PDF)

  61. Y. Zhang, C. Huard, S. Sriraman, J. Belen, A. Paterson and M. J. Kushner
    Investigation of Feature Orientation and Consequences of Ion Tilting During Plasma Etching with a Three-dimensional Feature Profile Simulator, J. Vac. Sci. Technol. A 35, 021303 (2017). [doi: 10.1116/1.4968392] (PDF)