PUBLICATIONS 2020
- I. V. Adamovich, T. Butterworth, T. Orriere, D. Z. Pai, D. A. Lacoste and M. S. Cha
Nanosecond Second Harmonic Generation for Electric Field Measurements with Temporal Resolution Shorter than Laser Pulse Duration, J. Phys. D: Appl. Phys. 53, 145201 (2020). [doi:10.1088/1361-6463/ab6790] - T. L. Chng, Ch. Ding, M. Naphade, B. M. Goldberg, I. V. Adamovich and S. M. Starikovskaia
Characterization of an Optical Pulse Slicer for Gas-Phase Electric Field Measurements Using Field-Induced Second Harmonic Generation, J. Instrumentation 15, C03005 (2020). [doi:10.1088/1748-0221/15/03/C03005] - T. L. Chng, M. Naphade, B. M. Goldberg, I. V. Adamovich and S. M. Starikovskaia
Electric Field Vector Measurements via Nanosecond Electric-field-induced Second-harmonic Generation, Optics Letters 45, 1942 (2020). [doi:10.1364/OL.45.001942] - L. Du, E. W. Hirsch, V. M. Donnelly and D. J. Economou
Effect of O2 Addition on the in-Plasma Photo-Assisted Etching of Silicon in a High-Density Discharge, J. Vac. Sci. Technol. A 38, 053003 (2020). [Invited paper, special issue commemorating J. Coburn] [doi:10.1116/6.0000338] - J. E. Foster, Y. Kovach, J. Lai and M. C. Garcia
Self-Organization in 1 atm DC Glows with Liquid Anodes: Current Understanding and Potential Applications, Plasma Science Sources and Technology, Plasma Sources Sci. Technol. 29, 034004 (2020). [doi:10.1088/1361-6595/ab7089] - Y. Fu, P. Zhang, J. P. Verboncoeur and X. Wang
Electrical Breakdown from Macro to Micro/nano Scales: A Tutorial and a Review of the State of the Art, Plasma Res. Express 2, 013001 (2020). [Invited Review]. [doi:10.1088/2516-1067/ab6c84] - Y. Fu, B. Zheng, P. Zhang, Q. H. Fan, J. P. Verboncoeur and X. Wang
Similarity of Capacitive Radio-Frequency Discharges in Nonlocal Regimes, Phys. Plasmas 27, 113501 (2020). [doi:10.1063/5.0022788] - Y. Fu, B. Zheng, D. Wen, P. Zhang, Q. H. Fan and J. P. Verboncoeur
High-Energy Ballistic Electrons in Low-Pressure Radio-Frequency Plasmas, Plasma Sources Sci. Technol. 29, 09LT01 (2020). [doi:10.1088/1361-6595/abb21b] - A. L. Garner, G. Meng, Y. Fu, A. M. Loveless, R. S. Brayfield and A. M. Darr
Transitions Between Electron Emission and Gas Breakdown Mechanisms Across Length and Pressure Scales, J. Appl. Phys. 128, 210903 (2020). [doi:10.1063/5.0030220] - V. Godyak
On Volt-ampere Characteristic of Symmetric CCP, Phys. Plasmas 27, 013504 (2020). [doi:10.1063/1.5122957] - E. W. Hirsch, L. Du, V. M. Donnelly and D. J. Economou
Evidence for Anti-synergism between Ion-assisted Etching and In-plasma Photo-assisted Etching of Silicon in a High-density Chlorine Plasma, J. Vac. Sci. Technol. A 38, 023009 (2020). [Invited paper, special issue commemorating J. Coburn]. [doi:10.1116/1.5138189] - B. Huang, C. Zhang, I. Adamovich, Yu. Akishev, and T. Shao
Surface Ionization Wave Propagation in the Nanosecond Pulsed Surface Dielectric Barrier Discharge: The Influence of Dielectric Material and Pulse Repetition Rate, Plasma Sources Sci. Technol. 29, 044001 (2020). [doi:10.1088/1361-6595/ab7854] - S. Huang, S. Shim, S. K. Nam and M. J. Kushner
Pattern Dependent Profile Distortion During Plasma Etching of High Aspect Ratio Features in SiO2, J. Vac. Sci. Technol. A 38, 023001 (2020). [doi:10.1116/1.5132800] - J. Jiang and P. J. Bruggeman
Spatially Resolved Absolute Densities of Reactive Species and Positive Ion Flux in He-O2 RF Driven Atmospheric Pressure Plasma Jet: Touching and Non-touching with Dielectric Substrate, J. Phys. D: Appl. Phys. 53, 28LT01. [doi:10.1088/1361-6463/ab813d] - J. Jiang, Y. Aranda Gonzalvo and P. J. Bruggeman
Absolute Spatially and Time-resolved O, O3, and Air Densities in the Effluent of a Modulated RF-driven Atmospheric Pressure Plasma Jet Obtained by Molecular Beam Mass Spectrometry, Plasma Proces. Polym. 17, e1900163 (2020). [doi:10.1002/ppap.201900163] - J. Jiang, Y. Aranda Gonzalvo and P. J. Bruggeman
Spatially Resolved Density Measurements of Singlet Oxygen in a Cold Atmospheric Pressure Jet by Molecular Beam Mass Spectrometry, Plasma Sources Sci. Technol. 29, 045023 (2020). [doi:10.1088/1361-6595/ab7f4b] - J.-E. Jung, Y. Barsukov, V. Volynets, G. Kim, S. K. Nam, K. Han, S. Huang, and M. J. Kushner
Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. II. Surface Reaction Mechanism, J. Vac. Sci. Technol. A 38, 023008 (2020). [doi:10.1116/1.5125569] - E. Kawamura, M. A. Lieberman, A. J. Lichtenberg and P. Chabert
Particle-in-cell Simulations and Passive Bulk Model of Collisional Capacitive Discharge, J. Vac. Sci. Technol. A 38, 023003 (2020). [doi:10.1116/1.5135575] - V. Kolobov, R. Arslanbekov and D. Levko
Electron Groups in Solar Wind and Gas Discharge Plasmas, J. Phys.: Conf. Ser. 1623 012006 (2020). [doi:10.1088/1742-6596/1623/1/012006] - V. S. S. K. Kondeti, Y. Zheng, P. Luan, G. S. Oehrlein and P. J. Bruggeman
O·, H·, and ·OH Radical Etching Probability of Polystyrene Obtained for a Radio Frequency Driven Atmospheric Pressure Plasma Jet, J. Vac. Sci. Technol. A 38, 033012 (2020). [doi:10.1116/6.0000123] - C. Li, V. Godyak, T. Hofmann, K. Edinger, and G. S. Oehrlein
Electron Beam Injection from a Hollow Cathode Plasma into a Downstream Reactive Environment: Characterization of Secondary Plasma Production and Si3N4 and Si Etching, J. Vac. Sci. Technol. A 38, 033001 (2020). [doi:10.1116/1.5143537] - C. Li, T. Hofmann, K. Edinger, V. Godyak and G. S. Oehrlein
Etching of Si3N4 Induced by Electron Beam Plasma from Hollow Cathode Plasma in a Downstream Reactive Environment, J. Vac. Sci. Technol. B 38, 032208 (2020). [doi:10.1116/1.5143538] - H. Li, Y. Zhou and V. M. Donnelly
Optical and Mass Spectrometric Measurements of the CH4−CO2 Dry Reforming Process in a Low Pressure, Very High Density, and Purely Inductive Plasma, J. Phys. Chem. A 124, 7271−7282 (2020). [doi:10.1021/acs.jpca.0c04033] - A. M. Lietz, E. V. Barnat, J. E. Foster and M. J. Kushner
Ionization Wave Propagation in a He Plasma Jet in a Controlled Gas Environment, J. Appl. Phys. 128, 083301 (2020). [Selected for cover of Journal of Applied Physics vol. 128, Issue 8, Aug. 2020] [doi:10.1063/5.0020264] - R. Lucken , A. Tavant, A. Bourdon, M. A. Lieberman and P. Chabert
Saturation of the Magnetic Confinement in Weakly Ionized Plasma, Plasma Sources Sci. Technol. 29, 065014 (2020). [doi:10.1088/1361-6595/ab38b2] - S. Mohades, A. M. Lietz and M. J. Kushner
Generation of Reactive Species in Water Film Dielectric Barrier Discharges Sustained in Argon, Helium, Air, Oxygen and Nitrogen, J. Phys. D: Appl. Phys. 53, 435206 (2020). [doi:10.1088/1361-6463/aba21a] - S. Mohades, A. M. Lietz, J. Kruszelnicki and M. J. Kushner
Helium Plasma Jet Interactions with Water in Well Plates, Plasma Process Polym. 17, e1900179 (2020). [doi:10.1002/ppap.201900179] - Z.-ul-I. Mujahid, J. Kruszelnicki, A. Hala and M. J. Kushner
Formation of Surface Ionization Waves in a Plasma Enhanced Packed Bed Reactor for Catalysis Applications, Chem. Engr. J. 382, 123038 (2020). [doi:10.1016/j.cej.2019.123038] - G. Oinuma, G. Nayak, Y. Du, and P. J. Bruggeman
Controlled Plasma-droplet Interactions: A Quantitative Study of OH Transfer in Plasma-liquid Interactions, Plasma Sources Sci. Technol. 29, 095002 (2020). [doi:10.1088/1361-6595/aba988] - K. Orr, Y. Tang, M. Simeni Simeni, D. van den Bekerom and I. V. Adamovich
Measurements of Electric Field in an Atmospheric Pressure Helium Plasma Jet by the E-FISH Method, Plasma Sources Sci. Technol. 29, 035019 (2020). [doi:10.1088/1361-6595/ab6e5b] - X. Pei, D. Gidon and D. B. Graves
Specific Energy Cost for Nitrogen Fixation as NOx Using DC Glow Discharge in Air, J. Phys. D: Appl. Phys. 53, 044002 (2020). [doi:10.1088/1361-6463/ab5095] - C. Qu, S. J. Lanham, S. C. Shannon, S. K. Nam and M. J. Kushner
Power Matching to Pulsed Inductively Coupled Plasmas, J. Appl. Phys. 127, 133302 (2020). [doi:10.1063/5.0002522] - V. Volynets, Y. Barsukov, G. Kim, J.-E. Jung, S. K. Nam, K. Han, S. Huang, and M. J. Kushner
Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. I. Plasma Source and Critical Fluxes, J. Vac. Sci. Technol. A 38, 023007 (2020). [doi:10.1116/1.5125568] - Z. Wang, J. Xu, Y. E. Kovach, B. T. Wolfe, E. Thomas Jr., H. Guo, J. E. Foster and H.-W. Shen
Microparticle Cloud Imaging and Tracking for Data-driven Plasma Science, Phys. Plasmas 27, 033703 (2020). [doi:10.1063/1.5134787] - Y. Yue, V. S. S. K. Kondeti and P. J. Bruggeman
Absolute Atomic Hydrogen Density Measurements in an Atmospheric Pressure Plasma Jet: Generation, Transport and Recombination from the Active Discharge Region to the Effluent, Plasma Sources Sci. Technol. 29, 04LT01 (2020). [doi:10.1088/1361-6595/ab7853] - J. Zhang, Y. Wang, D. Wang and D. J. Economou
Numerical Simulation of Streamer Evolution in Surface Dielectric Barrier Discharge with Electrode-array, J. Appl. Phys. 128, 093301 (2020). [doi:10.1063/5.0013594] - S. Zhang, Y. Li, A. Knoll and G. S. Oehrlein
Mechanistic Aspects of Plasma-enhanced Catalytic Methane Decomposition by Time-resolved Operando Diffuse Reflectance Infrared Fourier Transform Spectroscopy, J. of Phys. D: Appl. Phys. 53, 215201 (2020). [doi:10.1088/1361-6463/ab795b] - Y. Zhu, S. M. Starikovskaia, N. Yu. Babaeva and M. J. Kushner
Scaling of Pulsed Nanosecond Capillary Plasmas at Different Specific Energy Deposition, Plasma Sources Sci. Technol. 29, 125006 (2020). [doi:10.1088/1361-6595/abc413]