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U.S. Department of Energy Office of Science
Plasma Science and Engineering

PUBLICATIONS 2020

  1. I. V. Adamovich, T. Butterworth, T. Orriere, D. Z. Pai, D. A. Lacoste and M. S. Cha
    Nanosecond Second Harmonic Generation for Electric Field Measurements with Temporal Resolution Shorter than Laser Pulse Duration, J. Phys. D: Appl. Phys. 53, 145201 (2020). [doi:10.1088/1361-6463/ab6790]

  2. T. L. Chng, Ch. Ding, M. Naphade, B. M. Goldberg, I. V. Adamovich and S. M. Starikovskaia
    Characterization of an Optical Pulse Slicer for Gas-Phase Electric Field Measurements Using Field-Induced Second Harmonic Generation, J. Instrumentation 15, C03005 (2020). [doi:10.1088/1748-0221/15/03/C03005]

  3. T. L. Chng, M. Naphade, B. M. Goldberg, I. V. Adamovich and S. M. Starikovskaia
    Electric Field Vector Measurements via Nanosecond Electric-field-induced Second-harmonic Generation, Optics Letters 45, 1942 (2020). [doi:10.1364/OL.45.001942]

  4. L. Du, E. W. Hirsch, V. M. Donnelly and D. J. Economou
    Effect of O2 Addition on the in-Plasma Photo-Assisted Etching of Silicon in a High-Density Discharge, J. Vac. Sci. Technol. A 38, 053003 (2020). [Invited paper, special issue commemorating J. Coburn] [doi:10.1116/6.0000338]

  5. J. E. Foster, Y. Kovach, J. Lai and M. C. Garcia
    Self-Organization in 1 atm DC Glows with Liquid Anodes: Current Understanding and Potential Applications, Plasma Science Sources and Technology, Plasma Sources Sci. Technol. 29, 034004 (2020). [doi:10.1088/1361-6595/ab7089]

  6. Y. Fu, P. Zhang, J. P. Verboncoeur and X. Wang
    Electrical Breakdown from Macro to Micro/nano Scales: A Tutorial and a Review of the State of the Art, Plasma Res. Express 2, 013001 (2020). [Invited Review]. [doi:10.1088/2516-1067/ab6c84]

  7. Y. Fu, B. Zheng, P. Zhang, Q. H. Fan, J. P. Verboncoeur and X. Wang
    Similarity of Capacitive Radio-Frequency Discharges in Nonlocal Regimes, Phys. Plasmas 27, 113501 (2020). [doi:10.1063/5.0022788]

  8. Y. Fu, B. Zheng, D. Wen, P. Zhang, Q. H. Fan and J. P. Verboncoeur
    High-Energy Ballistic Electrons in Low-Pressure Radio-Frequency Plasmas, Plasma Sources Sci. Technol. 29, 09LT01 (2020). [doi:10.1088/1361-6595/abb21b]

  9. A. L. Garner, G. Meng, Y. Fu, A. M. Loveless, R. S. Brayfield and A. M. Darr
    Transitions Between Electron Emission and Gas Breakdown Mechanisms Across Length and Pressure Scales, J. Appl. Phys. 128, 210903 (2020). [doi:10.1063/5.0030220]

  10. V. Godyak
    On Volt-ampere Characteristic of Symmetric CCP, Phys. Plasmas 27, 013504 (2020). [doi:10.1063/1.5122957]

  11. E. W. Hirsch, L. Du, V. M. Donnelly and D. J. Economou
    Evidence for Anti-synergism between Ion-assisted Etching and In-plasma Photo-assisted Etching of Silicon in a High-density Chlorine Plasma, J. Vac. Sci. Technol. A 38, 023009 (2020). [Invited paper, special issue commemorating J. Coburn]. [doi:10.1116/1.5138189]

  12. B. Huang, C. Zhang, I. Adamovich, Yu. Akishev, and T. Shao
    Surface Ionization Wave Propagation in the Nanosecond Pulsed Surface Dielectric Barrier Discharge: The Influence of Dielectric Material and Pulse Repetition Rate, Plasma Sources Sci. Technol. 29, 044001 (2020). [doi:10.1088/1361-6595/ab7854]

  13. S. Huang, S. Shim, S. K. Nam and M. J. Kushner
    Pattern Dependent Profile Distortion During Plasma Etching of High Aspect Ratio Features in SiO2, J. Vac. Sci. Technol. A 38, 023001 (2020). [doi:10.1116/1.5132800]

  14. J. Jiang and P. J. Bruggeman
    Spatially Resolved Absolute Densities of Reactive Species and Positive Ion Flux in He-O2 RF Driven Atmospheric Pressure Plasma Jet: Touching and Non-touching with Dielectric Substrate, J. Phys. D: Appl. Phys. 53, 28LT01. [doi:10.1088/1361-6463/ab813d]

  15. J. Jiang, Y. Aranda Gonzalvo and P. J. Bruggeman
    Absolute Spatially and Time-resolved O, O3, and Air Densities in the Effluent of a Modulated RF-driven Atmospheric Pressure Plasma Jet Obtained by Molecular Beam Mass Spectrometry, Plasma Proces. Polym. 17, e1900163 (2020). [doi:10.1002/ppap.201900163]

  16. J. Jiang, Y. Aranda Gonzalvo and P. J. Bruggeman
    Spatially Resolved Density Measurements of Singlet Oxygen in a Cold Atmospheric Pressure Jet by Molecular Beam Mass Spectrometry, Plasma Sources Sci. Technol. 29, 045023 (2020). [doi:10.1088/1361-6595/ab7f4b]

  17. J.-E. Jung, Y. Barsukov, V. Volynets, G. Kim, S. K. Nam, K. Han, S. Huang, and M. J. Kushner
    Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. II. Surface Reaction Mechanism, J. Vac. Sci. Technol. A 38, 023008 (2020). [doi:10.1116/1.5125569]

  18. E. Kawamura, M. A. Lieberman, A. J. Lichtenberg and P. Chabert
    Particle-in-cell Simulations and Passive Bulk Model of Collisional Capacitive Discharge, J. Vac. Sci. Technol. A 38, 023003 (2020). [doi:10.1116/1.5135575]

  19. V. Kolobov, R. Arslanbekov and D. Levko
    Electron Groups in Solar Wind and Gas Discharge Plasmas, J. Phys.: Conf. Ser. 1623 012006 (2020). [doi:10.1088/1742-6596/1623/1/012006]

  20. V. S. S. K. Kondeti, Y. Zheng, P. Luan, G. S. Oehrlein and P. J. Bruggeman
    O·, H·, and ·OH Radical Etching Probability of Polystyrene Obtained for a Radio Frequency Driven Atmospheric Pressure Plasma Jet, J. Vac. Sci. Technol. A 38, 033012 (2020). [doi:10.1116/6.0000123]

  21. C. Li, V. Godyak, T. Hofmann, K. Edinger, and G. S. Oehrlein
    Electron Beam Injection from a Hollow Cathode Plasma into a Downstream Reactive Environment: Characterization of Secondary Plasma Production and Si3N4 and Si Etching, J. Vac. Sci. Technol. A 38, 033001 (2020). [doi:10.1116/1.5143537]

  22. C. Li, T. Hofmann, K. Edinger, V. Godyak and G. S. Oehrlein
    Etching of Si3N4 Induced by Electron Beam Plasma from Hollow Cathode Plasma in a Downstream Reactive Environment, J. Vac. Sci. Technol. B 38, 032208 (2020). [doi:10.1116/1.5143538]

  23. H. Li, Y. Zhou and V. M. Donnelly
    Optical and Mass Spectrometric Measurements of the CH4−CO2 Dry Reforming Process in a Low Pressure, Very High Density, and Purely Inductive Plasma, J. Phys. Chem. A 124, 7271−7282 (2020). [doi:10.1021/acs.jpca.0c04033]

  24. A. M. Lietz, E. V. Barnat, J. E. Foster and M. J. Kushner
    Ionization Wave Propagation in a He Plasma Jet in a Controlled Gas Environment, J. Appl. Phys. 128, 083301 (2020). [Selected for cover of Journal of Applied Physics vol. 128, Issue 8, Aug. 2020] [doi:10.1063/5.0020264]

  25. R. Lucken , A. Tavant, A. Bourdon, M. A. Lieberman and P. Chabert
    Saturation of the Magnetic Confinement in Weakly Ionized Plasma, Plasma Sources Sci. Technol. 29, 065014 (2020). [doi:10.1088/1361-6595/ab38b2]

  26. S. Mohades, A. M. Lietz and M. J. Kushner
    Generation of Reactive Species in Water Film Dielectric Barrier Discharges Sustained in Argon, Helium, Air, Oxygen and Nitrogen, J. Phys. D: Appl. Phys. 53, 435206 (2020). [doi:10.1088/1361-6463/aba21a]

  27. S. Mohades, A. M. Lietz, J. Kruszelnicki and M. J. Kushner
    Helium Plasma Jet Interactions with Water in Well Plates, Plasma Process Polym. 17, e1900179 (2020). [doi:10.1002/ppap.201900179]

  28. Z.-ul-I. Mujahid, J. Kruszelnicki, A. Hala and M. J. Kushner
    Formation of Surface Ionization Waves in a Plasma Enhanced Packed Bed Reactor for Catalysis Applications, Chem. Engr. J. 382, 123038 (2020). [doi:10.1016/j.cej.2019.123038]

  29. G. Oinuma, G. Nayak, Y. Du, and P. J. Bruggeman
    Controlled Plasma-droplet Interactions: A Quantitative Study of OH Transfer in Plasma-liquid Interactions, Plasma Sources Sci. Technol. 29, 095002 (2020). [doi:10.1088/1361-6595/aba988]

  30. K. Orr, Y. Tang, M. Simeni Simeni, D. van den Bekerom and I. V. Adamovich
    Measurements of Electric Field in an Atmospheric Pressure Helium Plasma Jet by the E-FISH Method, Plasma Sources Sci. Technol. 29, 035019 (2020). [doi:10.1088/1361-6595/ab6e5b]

  31. X. Pei, D. Gidon and D. B. Graves
    Specific Energy Cost for Nitrogen Fixation as NOx Using DC Glow Discharge in Air, J. Phys. D: Appl. Phys. 53, 044002 (2020). [doi:10.1088/1361-6463/ab5095]

  32. C. Qu, S. J. Lanham, S. C. Shannon, S. K. Nam and M. J. Kushner
    Power Matching to Pulsed Inductively Coupled Plasmas, J. Appl. Phys. 127, 133302 (2020). [doi:10.1063/5.0002522]

  33. V. Volynets, Y. Barsukov, G. Kim, J.-E. Jung, S. K. Nam, K. Han, S. Huang, and M. J. Kushner
    Highly Selective Si3N4/SiO2 Etching Using an NF3/N2/O2/H2 Remote Plasma. I. Plasma Source and Critical Fluxes, J. Vac. Sci. Technol. A 38, 023007 (2020). [doi:10.1116/1.5125568]

  34. Z. Wang, J. Xu, Y. E. Kovach, B. T. Wolfe, E. Thomas Jr., H. Guo, J. E. Foster and H.-W. Shen
    Microparticle Cloud Imaging and Tracking for Data-driven Plasma Science, Phys. Plasmas 27, 033703 (2020). [doi:10.1063/1.5134787]

  35. Y. Yue, V. S. S. K. Kondeti and P. J. Bruggeman
    Absolute Atomic Hydrogen Density Measurements in an Atmospheric Pressure Plasma Jet: Generation, Transport and Recombination from the Active Discharge Region to the Effluent, Plasma Sources Sci. Technol. 29, 04LT01 (2020). [doi:10.1088/1361-6595/ab7853]

  36. J. Zhang, Y. Wang, D. Wang and D. J. Economou
    Numerical Simulation of Streamer Evolution in Surface Dielectric Barrier Discharge with Electrode-array, J. Appl. Phys. 128, 093301 (2020). [doi:10.1063/5.0013594]

  37. S. Zhang, Y. Li, A. Knoll and G. S. Oehrlein
    Mechanistic Aspects of Plasma-enhanced Catalytic Methane Decomposition by Time-resolved Operando Diffuse Reflectance Infrared Fourier Transform Spectroscopy, J. of Phys. D: Appl. Phys. 53, 215201 (2020). [doi:10.1088/1361-6463/ab795b]

  38. Y. Zhu, S. M. Starikovskaia, N. Yu. Babaeva and M. J. Kushner
    Scaling of Pulsed Nanosecond Capillary Plasmas at Different Specific Energy Deposition, Plasma Sources Sci. Technol. 29, 125006 (2020). [doi:10.1088/1361-6595/abc413]